Remote plasma cleaning of optical surfaces: Cleaning rates of different carbon allotropes as a function of RF powers and distances

摘要

An extended study on an advanced method for the cleaning of carbon contaminations from large optical\udsurfaces using a remote inductively coupled low-pressure RF plasma source (GV10x DownStream Asher)\udis reported. Technical and scientific features of this scaled up cleaning process are analysed, such as the\udcleaning efficiency for different carbon allotropes (amorphous and diamond-like carbon) as a function of\udfeedstock gas, RF power (from 30 to 300W), and source-object distances (415 to 840 mm). The underlying\udphysical phenomena for these functional dependences are discussed.